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Etcher, 12" Wafer cooling method: Wafer backside cooling by He gas Wafer holding mechanism: Electrostatic adsorption (Ceramic ESC) Chamber material: 6061-T6 Aluminium alloy Chamber evacuation: Exhaust with a backing pump Ultimate pressure: ≤ 1.3 x 10^-3 Pa Chamber leak amount: ≤ 266 mPa/min Pressure monitor: 1333 Pa Pressure measurement range: 0 to atmospheric pressure Pressure control: Throttle valve Pressure interlock: half atom switch Wall / Cathode temperature control: heat exchanger Chamber wall circulating water flow sensor Chamber cathode circulating water flow sensor Process Kit: RAISED Si / Si KALREZ 8575 Dry Clean Chamber vacuum seal EDWARDS STP-A1603P 1600L/S 2 Turbo Pump TOYOTA T100L Pump EBARA ESR80WN Pump MKS/ENI GHW12 RF Generator, 13.56 MHz, 1250 W MKS/ENI B-5002-0SPECTRUM RF Generator, 2 MHz, 5000 W ADVANCED ENERGY VHF2760 RF Generator, 60 MHz, 2700 W Endpoint specification: Eye-D / 200-800nm HV Power supply Chamber liner: Yttrium liner Gas panel specification: AERA PI-980 MFC Gas line connection: Single Line Drop (SLD) connection SLD Specification: TESCOM SLD Regulator ENTEGRIS SLD Filter CKD SLD Manual valve Gas / Size C4F6 / 100 SCCM CH2F2 / 100 SCCM CH3F / 100 SCCM C4F8 / 100 SCCM CF4 / 300 SCCM CHF3 / 300 SCCM O2 / 2000 SCCM O2 / 200 SCCM O2 / 20 SCCM Ar / 200 SCCM Ar / 2000 SCCM N2 / 200 SCCM (2) Load lock chambers: Slow pump / fast pump switchable Equipped with cool down function Chamber material: 6061-T6 Aluminum alloy Chamber pressure monitor: Convectron gauge Chamber vacuum sealing method: Viton O-Ring VAT Slit valve Ultimate pressure: ≤ 13.3 Pa (100mTorr) Chamber leak amount: ≤ 1.33 Pa (10mTorr/min) Transfer chamber: Chamber pressure control: Auto Pressure Control (APC) Chamber material: 6061-T6 Aluminum alloy Chamber pressure monitor: Convectron gauge Chamber vacuum sealing method: Viton O-Ring VAT Slit valve Wafer transfer robot Wafer blade: Dual blade Chamber evacuation Ultimate pressure: ≤ 13.3 Pa Chamber leak amount: ≤ 1.33 Pa Remote signal tower Factory interface: YASKAWA LM Track Atmospheric Transfer robot No Right and left side storage pod (3) Loadports 25-Wafers FOUP No ionizer E84 PIO Sensor E99 Carrier ID Wafer mapper Power supply: 200/208 V, 60 Hz 2008 vintage.