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ID: 293724120
Coater / Developer system, 6"
Upgraded to AIO Duna 700
Wafer type: Silicon round wafer
Wafer flow: left to right
Standard poly floors
Teflon insulated mainframe wiring
Dual track
(3) CYBOR Photoresist pumps with controller
Brushless motor
Servo controller
Conversion kit, 4"
Automatic Transfer System (ATS) Assy
Indexer assembly:
Capacitance wafer sensor
3/16" Pitch (25-Wafer cassette setup)
Sliver teflon coated platform
Hot plate oven assembly:
Clear anodized 3-Pin (Temperature: < ±0.5°C)
3-Pin lift for wafer handling
AIO Enhanced cast-in heating element: 220V, 450W
WATLOW Controller with PID Control
Auto tuning ± 0.1% calibration accuracy
Temperature uniformity: ± 0.1°C
Digital LED Display
Proximity / contact bake control
Common stainless steel exhaust manifold assembly
RTD temperature probe
Temperature range: 50°C to 250°C
Coat module assembly:
Programmable pivoting moving dispense
3-Dispense lines / Top EBR Assy
AIO Low profile catch cup assembly with build-in Bottom EBR
Brushless spin motor
Servo controller
Programmable pre-dispense cup up to 99-Cycles
Pivoting Z-Axis moving dispense
Dispense nozzle: 3/16" x 3/16" x 3/16"
Digital vacuum switch
Top and bottom EBR
Interlocked safety cover
Solvent vapor tip bath
Purge system for dispense line
Positive developer module assembly:
Programable moving dispense assy
NESLAB CTD Cart
Brush high spin motor
Nozzle (Spray, stream, back wash)
Digital vacuum switch
Interlocked safety cover
CPU Board:
Direct interchangeable with SVG CPU
Store up to 99 programs
Capable component exercise
NETTRACK CPU board
(2) PCs, Windows XP
Power supply: 220/240V, Single Phase, 50/60Hz.
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