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ID#: 194493

Hersteller:

MAGNETRON

Modell:

Sputtering

Jahrgang:

2010

Wafer Größe:

4"-6"

Ausstattungsmerkmale:

Sputtering system, 4"-6"
In‐line 3‐target system
Process variables can be monitored via ZR-RX40

(2) PSICM DC Sputter power supplies
MKS 600 Series pressure controller
NOVA series ST580 Digital temperature
KODIVAC 340 Rotary pump

Main system:
(2) Chambers:
Sample chamber
Main chamber

Chamber size:
Main chamber: 3.5" x ~7"
Sample chamber: 2.5" x 3.5"
Control rack: 2" x 3"
Roughing pump: 2" x 2"

Sputter chamber: ~7" Wide and 1.5" height
Carrier slider: 1" Length Al plate

Gate valve chamber: 1.5" Length
Sputter gun section: (3) Guns

Lamp heater
Sputter target size: 300 mm x 100 mm
Installed target: ZnO, ZnO:Al, Empty
Isolation gate valve: 1 for sample, 1 for vacuum
Transport: Automatic motor driven

Vacuum system:
KODIVAC 1600K Rotary pump
GENESIS ICP 250L Cryo pump
Automatic vacuum / Process control with LED display
Vacuum sensor / Control: ATOVAC GVC22005

Sputter system:
Sputter power supply:
ADVANCED ENERGY RF-10S: 1 KW 13.56 MHz

(4) Gas flow controls:
SEAHWA KRO-4000
KOFLOC 3665
SEC 7440

Substrate motion control:
LED Panel display with speed controller

Manuals included
2010 vintage.
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