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ID#: 69386

Hersteller:

VARIAN

Modell:

3180

Wafer Größe:

4"

Ausstattungsmerkmale:

Sputtering systems, 4"
Throughput: 60 wafer/hr for 1 micron aluminum alloy deposition, independent of water size
Film thickness uniformity, 100mm: +/-5% across wafer for aluminum alloys excluding out 0.0625" of water
Film thickness uniformity, 125mm: +/-6.5% across wafer for aluminum alloys excluding out 0.0625" of water

Vacuum system:
Deposition chamber: Varian Cryostock-12FA closed-loops helium pump, 12"
Load lock: 14cfm

Deposition source:
Type: close-coupled dc conical Magnetron
Orientation: vertically mounted for sideways sputtering
Deposition rate: ~12,000A/min
Cathode: 7" dia., annular
Cathode life: 2000 one-micron

Deposition DC power supply: 12kW
Operating

Crated.
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