Gebraucht AMAT / APPLIED MATERIALS CMP 3600 #9160608 zu verkaufen

Reflexion system, 12" General features: (4) Titan heads (3) Platen systems Operator interface with monitor and keyboard Windows NT based software control Integrated electronics control cabinet Integrated applied materials factory interface on four-wide frame Integrated mesa cleaner including two brush scrubber modules Spin rinse dry module CD ROM Wafer type: Notch P/N 36-0103 Reflexion polisher type: Reflexion CMP poly system: P/N 36-0004 Software use license: P/N 36-1001E CMP System: Consumed process materials: Politex pads: P/N 36-1022 (2) IC1000 pads: P/N 36-1020 Metrology: Digital in situ removal monitor (ISRM) on cach platen Full scan ISRM on 3 Platens: P/N 36-5153 System regulation compliance: P/N 36-9801 Polisher options: Platen and head options: Clear windows on skins for polisher: P/N 36-5732 (4) UPA zones Profiler UPA: P/N 36-2039 Wafer loss sensor for dark pads: P/N 36-7939 With 50' cable Neslab S2HCFC-Free HX300: P/N AMAT Supplied platen temperature control Facilities options: System safety equipment 31” cleaner workspace: P/N 36-0115 Electrical requirements 200-230VAC 50/60Hz, input voltage: P/N 36-0119 Factory hookup: Cleaner drain manifold - 2 lines (1 slurry, 1 reclaim): P/N 36-0121 Operator interface options: User interface: 4 Color light tower, front of FI: P/N 36-0124 Vertical flush mounted RYGB LED lamp Cleaner for CMP reflexion system Module 1 (Megasonics): Megasonics: P/N 36-0502 Pressurized LDM: P/N 36-0503 Supports chemicals: A: High dilution 29% NH4OH B: 30% Hydrogen peroxide (H202) A: High dilution 29% NH40H B: 0.5% NCW-601A surfactant Module 2 & 3 (Brush scrubber modules): Brush scrubber modules (2) RIPPEY microclean brush: P/N 36-1679 (2) Direct feed LDM: P/N 36-0514 Supports the following chemicals; 0.05% -0.1% Ammonium hydroxide (NH40H) 0.5%-l% Hydrogen fluoride (HF) 200:1 Electroclean Pre-mixed SC-1 Pre-mixed proprietary chemical Module 4 (Spin rinse dry): Rinse with lamp dry: P/N 36-0519 Factory interface options: Integrated applied materials factory interface with 25-Wafer FQUP load ports Upper E84 Sensors and cables (2) Operator access switch: P/N 36-0260 Boron-free ULPA filter: P/N 36-0270 Four-wide factory interface frame with two load Ports: P/N 36-0350 Load Ports in positions 1 and 3. (2) E99 Carrier ID, keyence (BCR FOUP ID reader): P/N 36-0258 Additional options: System manuals: CD ROM manual set: P/N 36-0128 Cleanroom reflexion manual set: P/N 36-0130 (English) printed on cleanroom paper Additional items: Generic monthly consumables kit: P/N 36-78300 Includes: (16) O-ring (2) Filters (3) DDF3 Diaphragm Pad conditioner head assembly: P/N 36-7550 Set up / maintenance options: Polisher to cleaner alignment fixture: P/N 36-8211 Alignment and leveling tool kit (FI – Datum Gauge): P/N 36-0142 Factory interface service lift: P/N 36-0245 One year PM kit: P/N 36-8979 Walking beam alignment tool: P/N 36-2535 Wet robot calibration tool: P/N 36-6141 Spares: (10) Brush disk: P/N 0020-78263 ECO 10424 - REV1P Kit, option 3 slurries AB-AB-AC: P/N 0240-15146 Configuration: Kit, option brush and adapter for pad: P/N 0240-16013 Conditioner, reflexion Option kit, user interface, flat panel, Wall mounted for TTW reflexion: P/N 0240-06004 (4) 300mm Titan heads: P/N 36-5675 Retaining ring: Grooved PL PPS Membrane support plate: 0.5 inch, 0mm Edge bump, WAS Support pad: 0.5 inch Perf holes Edge control ring: 11.434 inch OD Upper ASM: A-2-50 Membrane: Neoprene Dry nova 3030: TEMPNSR-03 300MM Titan head with grooved: TEMPNSR-04 Retaining ring CE Marked 2002 vintage.