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Hersteller
ASML
Modell
PAS 5500 / 500
ID: 9049994
Stepper with DNS tracks Slit Uniformity Operator:MSA Machine:XXXX Release:8.7.0 Date:09/05/2012 Time:18:01 Comment : Measurement mode Scanning : N Start position : Leftside Measurement settings Fieldsize [mm] X : 26.000 Y : 11.940 Steps X : 11 Y : 51 Number of Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Miscellaneous Apply REMA Window : Yes Illumination Mode Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Uniformity Measurement Results Uniformity [%] : 0.48 X-Tilt [%/field] : -1.08 Symmetrical error [%] : -0.14 Logfile : LI/LISU/waf.1225 Overall Average of Ratio : 1.00 Standard Deviation : 0.00 Intensities Spot Sensor [mW/cm2] : 585.60 Standard Deviation : 1.90 Intensities Energy Sensor [mW/cm2] : 586.80 Standard Deviation : 0.17 Estimated Uniformity from measured data [%] If corrected for actual tilt : 0.21 If corrected with gradient filter : 0.48 If corrected for tilt and with gradientfilter : 0.07 ############################################################################ ############################################################################ Slit Uniformity Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:02 Comment : Annular Measurement mode Scanning : N Start position : Leftside Measurement settings Fieldsize [mm] X : 26.000 Y : 11.940 Steps X : 11 Y : 51 Number of Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Miscellaneous Apply REMA Window : Yes Illumination Mode Illumination Mode : Annular Numerical Aperture : 0.57 Sigma Outer : 0.750 Inner : 0.450 Illumination mode name : annular Version : 1.0.0 Uniformity Measurement Results Uniformity [%] : 0.90 X-Tilt [%/field] : -1.75 Symmetrical error [%] : -0.37 Logfile : LI/LISU/waf.1224 Overall Average of Ratio : 1.00 Standard Deviation : 0.01 Intensities Spot Sensor [mW/cm2] : 605.13 Standard Deviation : 3.65 Intensities Energy Sensor [mW/cm2] : 606.53 Standard Deviation : 0.12 Estimated Uniformity from measured data [%] If corrected for actual tilt : 0.42 If corrected with gradient filter : 0.81 If corrected for tilt and with gradientfilter : 0.08 ############################################################################ ############################################################################ Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:10:38 Uniformity Measurement Comment : Image Field Size [mm] x : 26.0 y : 3.0 Diameter : 40.0 Steps x : 11 y : 3 Measurement Type : Pulse Mode Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Apply REMA Window : Yes Load Reticle : N Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Uniformity Measurement Result Uniformity [%] : 0.61 Logfile : LI/LIUM/waf.1443 Tilt X [%/field] : -0.91 Y [%/field] : -0.03 Overall Average of Ratio : 1.00 Standard Deviation : 0.00 Intensities Spot Sensor [mW/cm2] : 586.44 Standard Deviation : 1.93 Intensities Energy Sensor [mW/cm2] : 587.55 Standard Deviation : 0.38 Estimated Uniformity from measured data [%] If corrected for actual tilts : 0.37 If corrected with gradient filter : 0.45 If corrected for tilts and with gradientfilter : 0.26 Total Nr of Laserpulses since Installation [* 10^6] : 12454.98 Symmetric Uniformity Value [%] : 0.12 ############################################################################ ############################################################################ Scanning Dose Accuracy & Repeatability Test Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:19 Comment : Scanning : Y Scan Direction : Forwards Scan Type Settings : All scans SingleScan Die size [mm] X : 2.000 Y : 5.000 Spot Sensor Coordinates on Die [mm] X : 0.000 Y : -2.000 Rema Mode : Die Number of Repeats for each dose: : 100 Illumination Mode Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Dose Control Mode : High Performance Dose Control Logfile : LI/LISA/waf.149 Result Table +----------+-----------------------------------------+-------+--------+--------+ | | Recorded Exposure Energy Dose | | | | | +----------+--------+----------+----------+ | | | | Dose | Mean | Stddev | Min | Max |Repeat | Acc | Sum | | [mJ/cm2] | [mJ/cm2] |[mJ/cm2]| [mJ/cm2] | [mJ/cm2] | [%] | [%] | [%] | +==========+==========+========+==========+==========+=======+========+========+ | 5.00 | 5.09 | 0.00 | 5.08 | 5.10 | 0.24 | 1.77 | 2.00 | | 10.00 | 10.21 | 0.01 | 10.19 | 10.23 | 0.22 | 2.07 | 2.29 | | 20.00 | 20.31 | 0.01 | 20.28 | 20.35 | 0.18 | 1.56 | 1.74 | | 30.00 | 30.39 | 0.01 | 30.35 | 30.44 | 0.14 | 1.32 | 1.46 | | 40.00 | 40.54 | 0.02 | 40.50 | 40.59 | 0.11 | 1.35 | 1.45 | | 50.00 | 50.57 | 0.02 | 50.52 | 50.62 | 0.10 | 1.14 | 1.24 | | 100.00 | 101.04 | 0.05 | 100.93 | 101.16 | 0.11 | 1.04 | 1.15 | | 150.00 | 151.39 | 0.08 | 151.27 | 151.55 | 0.09 | 0.93 | 1.02 | +----------+----------+--------+----------+----------+-------+--------+--------+ Max. Repeatability [%] : 0.24 Min. Repeatability [%] : 0.09 Max. Accuracy [%] : 2.07 Min. Accuracy [%] : 0.93 Max. Sum [%] : 2.31 Min. Sum [%] : 1.02 ############################################################################ ############################################################################ ============================================================================== Dyn System Qual;Image Plane - ...ification/Dynamic/Single Energy/Model ; Dynamic Operator:MSA Machine:XXXX Release:8.7.0 Date:11/21/2012 Time:11:27 Exposure conditions: Exposure date and time : Sun Aug 19 11:46:56 2012 Machine ID : XXXX Reticle ID : 45441782A019 Reticle Alignment : TTL Align Lens type : 79 Temperature [degC]: 22.00 Pressure [mbar]: 1023.25 Illumination Mode : Conventional Blade ID : Not Applicable Numerical Aperture : 0.57 Sigma Inner : Not Applicable Sigma Outer : 0.75 Lens ID : 0105624A Focus Step [um]: 0.12 Focus Offset [um]: -0.90 Number of wafers : 2 Comments: 'Exposure': MPM 'Modelling': Data File Name: XXXX_MPM8_081912 ============================================================================== Uncorrected values: +----------------------------------------------------------+ | | Mean | Std. Dev. | |==========================================================| | Focus range [nm] | 148 | 20 | | Raw astigmatism [nm] | 106 | 6 | +----------------------------------------------------------+ Correctables: +-------------------------------------------+ | Image offset [um] | 0.049 | | Image tilt in x (Ry) [urad] | 0.195 | | Element 1 height [um] | 0.722 | | | | | RS linear wedge [urad] | -0.546 | | RS quadratic wedge [nm/cm2] | -3.749 | +-------------------------------------------+ Result after corrections: +----------------------------------------------------------+ | | Mean | Std. Dev. | |==========================================================| | Image plane deviation [nm] | 151 | 16 | | Astigmatism [nm] | 106 | 7 | +----------------------------------------------------------+ determined on 91 field positions. ############################################################################ ############################################################################ Operator:MSA Machine:XXXX Release:8.7.0 Date:08/18/2010 Time:17:42 Focus Reproducibility Measurements Position : Wafer Position X [mm] : 0.00 Y [mm] : 0.00 Number of measurements : 100 Output Data Type : Full Configuration Reference Branch : Y Fine p : Y q : Y Window Height [nm] Coarse : 250 Fine : 250 Tilt [urad] Rx : 100 Ry : 100 Absolute results +---------+------------+------------+------------+------------+ | | Z | Rx | Ry | TotZ | | | [um] | [urad] | [urad] | [um] | +=========+============+============+============+============+ | Avg | -9.7701 | -39.8370 | -38.0575 | -10.5218 | | Max | -9.7515 | -38.2445 | -36.3055 | -10.4992 | | Min | -9.7916 | -42.0147 | -39.8978 | -10.5497 | | Max-Min | 0.0401 | 3.7701 | 3.5923 | 0.0504 | | Stddev | 0.0079 | 0.6756 | 0.7289 | 0.0125 | +---------+------------+------------+------------+------------+ Relative results (to average) +---------+------------+------------+------------+------------+ | | Z | Rx | Ry | TotZ | | | [um] | [urad] | [urad] | [um] | +=========+============+============+============+============+ | Avg | 0.0000 | 0.0000 | 0.0000 | 0.0000 | | Max | 0.0186 | 1.5925 | 1.7521 | 0.0225 | | Min | -0.0216 | -2.1776 | -1.8402 | -0.0279 | +---------+------------+------------+------------+------------+ Termination Status terminated : Normally error count : 0 Measured data (Absolute) +------------+------------+------------+------------+ | Z | Rx | Ry | TotZ | | [um] | [urad] | [urad] | [um] | +============+============+============+============+ | -9.7655 | -40.5165 | -36.9648 | -10.5074 | | -9.7800 | -39.5127 | -37.1097 | -10.5173 | | -9.7769 | -39.7916 | -38.9125 | -10.5394 | | -9.7790 | -40.3539 | -38.2437 | -10.5364 | | -9.7785 | -39.5528 | -38.7713 | -10.5377 | | -9.7649 | -40.4179 | -37.2816 | -10.5102 | | -9.7732 | -42.0147 | -36.8241 | -10.5229 | | -9.7821 | -39.0658 | -38.4235 | -10.5336 | | -9.7652 | -39.7742 | -37.5021 | -10.5093 | | -9.7684 | -39.3748 | -37.6588 | -10.5119 | | -9.7652 | -39.5564 | -36.9409 | -10.5006 | | -9.7634 | -40.8306 | -37.7038 | -10.5169 | | -9.7515 | -40.6355 | -37.3565 | -10.4992 | | -9.7603 | -40.2630 | -37.1124 | -10.5025 | | -9.7786 | -39.3249 | -37.7339 | -10.5227 | | -9.7643 | -40.6762 | -37.9644 | -10.5202 | | -9.7675 | -40.4179 | -37.3377 | -10.5136 | | -9.7776 | -38.8425 | -38.0860 | -10.5232 | | -9.7718 | -40.2938 | -37.3000 | -10.5166 | | -9.7681 | -40.0046 | -38.3063 | -10.5241 | | -9.7748 | -39.3195 | -36.3055 | -10.5004 | | -9.7667 | -40.5930 | -38.2534 | -10.5258 | | -9.7868 | -39.8798 | -38.2696 | -10.5415 | | -9.7745 | -39.9436 | -38.9972 | -10.5391 | | -9.7645 | -39.8327 | -39.0892 | -10.5296 | | -9.7701 | -40.2804 | -36.7024 | -10.5070 | | -9.7814 | -40.2261 | -37.8231 | -10.5325 | | -9.7794 | -39.8133 | -39.0155 | -10.5434 | | -9.7750 | -39.0829 | -39.1232 | -10.5357 | | -9.7797 | -40.6502 | -37.6666 | -10.5315 | | -9.7672 | -40.4168 | -36.7030 | -10.5050 | | -9.7761 | -39.1525 | -38.2369 | -10.5258 | | -9.7870 | -39.0503 | -38.4891 | -10.5392 | | -9.7577 | -41.1639 | -36.8837 | -10.5027 | | -9.7570 | -41.1076 | -38.2929 | -10.5199 | | -9.7714 | -40.7037 | -37.9743 | -10.5276 | | -9.7568 | -39.8498 | -38.0060 | -10.5080 | | -9.7710 | -39.3692 | -39.7966 | -10.5423 | | -9.7646 | -39.8609 | -37.4839 | -10.5090 | | -9.7721 | -39.6824 | -38.3422 | -10.5265 | | -9.7604 | -39.2479 | -37.4802 | -10.5008 | | -9.7536 | -39.2437 | -38.4132 | -10.5061 | | -9.7657 | -40.2048 | -37.6258 | -10.5141 | | -9.7762 | -39.6844 | -37.8291 | -10.5239 | | -9.7702 | -38.8947 | -37.6470 | -10.5105 | | -9.7612 | -40.1875 | -38.2415 | -10.5176 | | -9.7792 | -39.8850 | -37.5037 | -10.5240 | | -9.7729 | -39.1850 | -37.2381 | -10.5098 | | -9.7613 | -40.7197 | -37.9457 | -10.5173 | | -9.7705 | -39.9194 | -39.2022 | -10.5376 | | -9.7564 | -38.9419 | -39.4759 | -10.5207 | | -9.7694 | -39.1124 | -39.8978 | -10.5404 | | -9.7720 | -39.1279 | -38.2178 | -10.5212 | | -9.7916 | -39.8522 | -38.5405 | -10.5497 | | -9.7741 | -40.0793 | -38.6619 | -10.5352 | | -9.7691 | -39.9331 | -38.1660 | -10.5228 | | -9.7792 | -40.3889 | -38.7946 | -10.5440 | | -9.7717 | -39.1853 | -37.4060 | -10.5107 | | -9.7745 | -40.9147 | -38.2744 | -10.5360 | | -9.7732 | -39.6131 | -37.6885 | -10.5187 | | -9.7787 | -39.9724 | -37.8588 | -10.5287 | | -9.7762 | -40.0535 | -38.1205 | -10.5301 | | -9.7629 | -40.5288 | -36.8900 | -10.5039 | | -9.7702 | -39.5173 | -37.6971 | -10.5151 | | -9.7761 | -39.9947 | -38.1668 | -10.5303 | | -9.7680 | -38.8518 | -37.8147 | -10.5102 | | -9.7658 | -39.8365 | -37.7452 | -10.5134 | | -9.7689 | -40.1078 | -37.1308 | -10.5103 | | -9.7742 | -39.4813 | -38.4813 | -10.5291 | | -9.7727 | -39.9902 | -37.2798 | -10.5153 | | -9.7634 | -39.8633 | -37.0637 | -10.5023 | | -9.7711 | -38.2445 | -37.7369 | -10.5083 | | -9.7732 | -40.2596 | -37.2719 | -10.5174 | | -9.7761 | -40.3531 | -37.6834 | -10.5262 | | -9.7766 | -40.0425 | -38.9605 | -10.5413 | | -9.7674 | -39.8253 | -38.4360 | -10.5239 | | -9.7772 | -39.5769 | -38.3233 | -10.5307 | | -9.7698 | -38.7025 | -39.2795 | -10.5301 | | -9.7688 | -38.7997 | -38.1785 | -10.5153 | | -9.7768 | -39.4022 | -37.5756 | -10.5194 | | -9.7820 | -39.3415 | -38.4344 | -10.5354 | | -9.7578 | -39.4880 | -38.3495 | -10.5110 | | -9.7767 | -39.9885 | -38.1482 | -10.5306 | | -9.7615 | -39.7493 | -39.0979 | -10.5262 | | -9.7602 | -39.8560 | -38.0996 | -10.5126 | | -9.7674 | -39.6038 | -39.2936 | -10.5336 | | -9.7559 | -39.3433 | -38.7500 | -10.5134 | | -9.7652 | -40.7314 | -37.6660 | -10.5176 | | -9.7556 | -39.0180 | -38.6828 | -10.5101 | | -9.7736 | -38.5990 | -38.6164 | -10.5246 | | -9.7659 | -40.0684 | -37.5131 | -10.5120 | | -9.7717 | -40.3805 | -39.0647 | -10.5400 | | -9.7767 | -40.0894 | -39.2315 | -10.5453 | | -9.7738 | -39.3731 | -38.5647 | -10.5291 | | -9.7687 | -39.5713 | -38.4534 | -10.5238 | | -9.7522 | -38.9775 | -38.4677 | -10.5037 | | -9.7614 | -41.1591 | -37.7801 | -10.5180 | | -9.7636 | -41.2565 | -38.6489 | -10.5321 | | -9.7665 | -38.2850 | -37.7461 | -10.5041 | | -9.7770 | -39.8987 | -38.2130 | -10.5312 | +------------+------------+------------+------------+ ############################################################################ ############################################################################ Dynamic System Qualification ; Distortion - ...ification/Dynamic/Model ; Dynamic Operator:ASM Machine:4418 Release:8.8.6 Date:11/26/2012 Time:11:19 System Qualification Exposure Layer : --- First --- Date/Time : Sun Aug 19 10:59:23 2012 Machine ID : XXXX Reticle ID : 45443171A103 Reference Grid : Matching set ID : NOMINAL Reticle Alignment : TTL Align Wafer Alignment : TTL Align Lens Type : 79 Lens ID : 0105624A Energy [mJ/cm2] : 33.0 Focus Offset [um] : 0.00 Illumination Mode : Conventional Blade ID : Numerical Aperture : 0.57 Sigma Inner : Sigma Outer : 0.75 Temperature [degC] : 22.0 Pressure [mbar] : 1023.4 Wavelength [nm] : 248.281 Comments from: 'Exposure First Layer' : MPM 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYD_XXXX_MPM8_081912.tlg Optimization Method : Least-Squares Number of Wafers : 1 Number of Rejected Wafers : 0 Number of Fields per Wafer : 12 Number of Marks per Field : 49 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : First to Nominal Set Threshold : OFF Reticle data used : Reticle data from testlog Reticle layout used : 4X_SU_DYNA_7X7 ============================================================================== Uncorrected values: +----------------------------------+---------+---------+ | | Mean |Std. Dev.| | | [nm] | [nm] | +==================================+=========+=========+ | max. image displacement x | 38.0 | 4.5 | | max. image displacement y | 37.5 | 7.4 | +----------------------------------+---------+---------+ Correctables: +------------------------------+----------+----------+ | | Mean |Std. Dev. | +==============================+==========+==========+ | RS height [um] | -0.072 | 1.431 | | RS tilt in x (Ry) [urad] | 216.176 | 32.303 | | Element 2 height [um] | 0.060 | 0.109 | | Translation in X [um] | 0.019 | 0.006 | | Translation in Y [um] | -0.004 | 0.005 | | Lens rotation [urad] | 0.157 | 0.116 | | Scan skew [urad] | 0.118 | 0.048 | | Scan scale [ppm] | 0.225 | 0.200 | +------------------------------+----------+----------+ Result after corrections: +----------------------------------+---------+---------+ | | Mean |Std. Dev.| | | [nm] | [nm] | +==================================+=========+=========+ | image distortion (NCE) x | 17.2 | 6.7 | | image distortion (NCE) y | 27.7 | 4.8 | +----------------------------------+---------+---------+ ############################################################################ ############################################################################ Model - ...ogy Verification/Overlay/Wafer Stage Accuracy/Dynamic/Single Velocity Operator:MSA Machine:XXXX Release:8.7.0 Date:05/06/2012 Time:07:12 Wafer Stage Accuracy Exposure Layer : --- First --- Date/Time : Sat May 5 17:30:29 2012 Machine ID : XXXX Reticle ID : 45443171A103 Reference Grid : Matching set ID : NOMINAL Reticle Alignment : TTL Align Wafer Alignment : No Align Lens Type : 79 Lens ID : 0105624A Energy [mJ/cm2] : 33.0 Focus Offset [um] : 0.00 Illumination Mode : Conventional Blade ID : Numerical Aperture : 0.57 Sigma Inner : Sigma Outer : 0.75 Temperature [degC] : 22.0 Pressure [mbar] : 1026.9 Wavelength [nm] : 248.278 Comments from: 'Exposure First Layer' : after hp laser replacement 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYW_SA_050512.tlg Optimization Method : Least-Squares Number of Wafers Measured : 1 Number of Fields per Wafer : 20 Number of Marks per Field : 25 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | -1 | -1 | | | St. Dev. | 2 | 2 | | | |Mean| + 3 Sigma | 7 | 7 | | | Maximum 99.7% | 7 | 7 | 8 | +------------------+---------+---------+---------+ Intrafield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | -0.001 | 0.001 | -1 | 1 | | Translation in Y [um] | -0.001 | 0.002 | -1 | 2 | | Rotation [urad] | -0.008 | 0.066 | -0 | 1 | | Magnification [ppm] | -0.029 | 0.086 | -1 | 2 | | 3rd Order Dist. [nm/cm3] | 0.266 | 1.537 | 1 | 3 | | Trapezoid in X [um/cm2] | | | | | | Trapezoid in Y [um/cm2] | | | | | | 4th Ord. Trap. X [um/cm4] | | | | | | 4th Ord. Trap. Y [um/cm4] | | | | | | Asymm. Rotation [um] | 0.009 | 0.062 | 0 | 1 | | Asymm. Magnification [ppm] | -0.003 | 0.108 | -0 | 2 | +------------------------------+----------+----------+----------+----------+ Residuals for this batch: +--------------------+---------+ | | Value | +====================+=========+ | Residual X [nm] | 1 | | Residual Y [nm] | 1 | +--------------------+---------+ Wafer Stage Classification: +---------------------------+---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +===========================+=========+=========+=========+ | Stage Repeatability | 3 | 4 | | | Stage Accuracy | 7 | 7 | 8 | +---------------------------+---------+---------+---------+ ############################################################################ ############################################################################ Model - Metrology Calibration/Machine Matching/Intrafield Operator:MSA Machine:XXXX Release:8.7.0 Date:09/22/2012 Time:08:52 Machine to Machine Matching Exposure Layer : --- First --- : --- Second --- Date/Time : Thu Oct 26 10:52:45 2000 : Sat Sep 22 08:16:35 2012 Machine ID : XXXX : XXXX Reticle ID : 45441181A015 : 45441181A015 Reference Grid : : Matching set ID : DEFAULT : ORIGINAL Reticle Alignment : TTL Align : TTL Align Wafer Alignment : TTL Align : TTL Align Lens Type : 79 : 79 Lens ID : 0105624A : 0105624A Energy [mJ/cm2] : 30.0 : 33.0 Focus Offset [um] : 0.00 : 0.00 Illumination Mode : Default : Conventional Blade ID : : Numerical Aperture : 0.57 : 0.57 Sigma Inner : 0.00 : Sigma Outer : 0.75 : 0.75 Temperature [degC] : 22.0 : 22.0 Pressure [mbar] : 1014.1 : 1021.8 Wavelength [nm] : 248.288 : 248.282 Comments from: 'Exposure First Layer' : 'Exposure Second Layer' : 'Measure Mark Positions' : WPM 'XY-Imaging Modelling' : Test Log Name : XYM_zmatchbcf09222012.tlg Optimization Method : Least-Squares Number of Wafers Measured : 1 Number of Fields per Wafer : 16 Number of Marks per Field : 17 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | 0 | 0 | | | St. Dev. | 5 | 6 | | | |Mean| + 3 Sigma | 14 | 18 | | | Maximum 99.7% | 14 | 21 | 24 | +------------------+---------+---------+---------+ Maximum Overlay Error positions for this Batch: +------+---------+---------+---------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DX | Stdev | DY | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+=========+=========+=========+===============+===============+ | 1 | 6 | 3 | 2 | 0.000 | -10.800 | | 2 | 5 | 4 | 2 | 10.800 | 0.000 | | 3 | 4 | 4 | 1 | 0.000 | -6.480 | | 4 | 4 | 2 | 2 | -10.800 | 0.000 | | 5 | 3 | 5 | 1 | -6.480 | 6.480 | | 6 | 3 | 6 | 1 | 10.800 | 10.800 | | 7 | 3 | 5 | 3 | 0.000 |
ASML PAS 5500/500 ist ein Wafer-Stepper, der in der Halbleiterindustrie zur Herstellung integrierter Schaltungen verwendet wird. Es verwendet Laser, um Merkmale auf dem Substrat photolithographisch zu definieren. Das Gerät ist hochpräzise und in der Lage, bildgebende Funktionen mit einer Breite von bis zu 0,2 Mikrometer. Es ist auf einem starren Rahmen gebaut, um minimale Verzerrungen und Vibrationen zu gewährleisten, so dass es für Präzisionsbildanwendungen geeignet ist. Das System verwendet eine F2-Laserquelle, die im Vergleich zu herkömmlichen Argon-Ionen-Laserquellen eine überlegene Leistung aufweist. Es bietet einen einheitlichen Strahl, der eine präzisere Abbildung ermöglicht. Der Laser wird mit Hilfe eines optischen Weges von Spiegeln und Linsen in das Gerät eingekoppelt und mit einem optomechanischen Verschluss die Belichtung des Wafers gesteuert. Die Maschine verwendet ein Videoprojektionsausrichtwerkzeug (VPAS) für mehr Genauigkeit in der optischen Ausrichtung. Dieses Asset verwendet eine Projektion eines Gittermusters auf den Wafer. Die Ausrichtungssensoren erfassen die Position und Neigung des Wafers, um Fehler zu minimieren. PAS 5500/500 verwendet auch zwei Arten von Injektoren, um den Wafer und die Optik genau zu positionieren. Der mechanische Injektor wird für größere Schritte verwendet, während der Piezo-Injektor für kleine Schritte verwendet wird. Die Injektoren sind in eine motorisierte Drehstufe integriert, die genaue Drehbewegungen gewährleistet. ASML PAS 5500/500 verwendet ein Linearantriebsmodell, um sich in XY-Richtung zu bewegen. Sie besteht aus einem Positionsgeber, Motor und einem Schrittmotor. Das Gerät verfügt außerdem über mehrere optische Elemente, die den bildgebenden Prozess unterstützen. Dazu gehören ein Mikroskop, ein Reflektor, eine Iris und ein Kondensator. Das System verwendet einen definierten Schrittalgorithmus für den bildgebenden Prozess. Dies beinhaltet die Einstellung der Belichtungszeit, Dosierung und Wiederholungszahl. Die Wiederholungszahl bestimmt, wie oft das Muster auf den Wafer abgebildet wird. Diese Funktion ermöglicht zusammen mit der End-of-Scan-Erkennungseinheit eine präzise Bildgebung und einen optimierten Durchsatz. Die Maschine ist in die APC-Software (Automated Photomask Creation) integriert, die die Maskenerzeugung unterstützt. Es enthält Funktionen wie Maskenausrichtung, Stanzregistrierung und OPC. Insgesamt ist PAS 5500/500 ein hochpräzises und automatisiertes Wafer-Schrittwerkzeug, das in der Halbleiterherstellung verwendet wird. Es verwendet erweiterte Funktionen wie eine F2-Laserquelle, VPAS für die optische Ausrichtung und APC-Software für eine überlegene Bildgebungsleistung.
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