Gebraucht TEL / TOKYO ELECTRON UW-300Z #9204046 zu verkaufen

Wet station, 12" Main computer Bath SRM Tank Temperature controller Heater Exhaust unit FOUP Type 1: ENTEGRIS (AF3CWFAB20BUAFW) FOUP Type 2: DAINICHI (SF300-02) Wafer pitch: Half pitch Arm Wafer flow direction: Rear / Front Number of wafers in process: (2) FOUP (25) Slots FOUP Chemical central supply SD2 Dryer: Rinse and dry Stocker: (12) FOUPs Chemical: HF NH4OH H2O2 HCL IPA O3W Mainframe: Frame per and (2) Bath modules Chemical bath: (4) Bath modules Does not include CW and SD2 No factory mutual External units: Fire extinguisher O3 Gas generator No fluorescent lamp Adjuster plate SS-304: 15 x 100 x 100 mm Seismic bracing Air operated valve Display bath level sensor: Arm side and M/C Outer panel material (C/S and SD2): SPCC Chemical area panel material: Clear PVC AMHS: OHT No MMHS FOUP ID Reader On-line: GEM: SEMI E5 and E30 I/O Interface: HSMS to LAN (SEMI E37) Signal tower: Front and maintenance area CPU: PIII (600 MHz) Operating system: Windows NT Media: Floppy and zip FOUP Station: Load port: (2) FOUP FOUP Present sensor Notch adjustment function Shutter Area sensor KEYENCE BL601 FOUP ID Reader FIMS Port (POD Opener): Jump slot sensor Wafer number and slot sensor Carrier transfer: FOUP Check sensor Stocker: (12) FOUPs FFU Location: Upper section LD / ULD (PTFE) Course / Posture changer: Pre-post changeover Process number: 25 Wafers LD / ULD: Changes pre-post Wafer hand turn function Face to face function: (2) Carriers Wafer hand material: PCTFE Ionizer: 5024CE Controller Other: Direction access M/C media: Right side Temporary wafer holder Process modules: Module 1: SPOM Process temperature: 80°C~140°C Heating method: KOMATSU AIH-64QS CS Heater Bath material: Quartz Module 2: QDR (Hot) Process temperature: 70°C/20°C No hot DIW gen Central supply Bath material: Quartz No MEGASONIC DIW Shower (Hot) Module 3: SC1(M/S) Process temperature: 30°C~70°C Heating method: CS Heater with water jacket Change mixing ration recipe Bath material: PTFE HORIBA CS-131 Concentration monitoring KOKUSAI Alfa MEGASONIC, 2.4 kW Module 4: POU Process temperature: RT°C / Hot 70°C No hot DIW Gen Supplied Bath material: Quartz Chemical: HCL SD2 (Rinse + dry) Facilities: CDA N2 DIW PCW CM1: H2SO4 CM2: H2O2 CM3: NH4OH CM4: HCL CM5: IPA Exhaust: General Solvent (SD2) Acid (SD2, POU) Alkali (POU, SC1) Acid (SPOM, QDR) Separate drains AC Power: EP1 (Normal): 208 VAC, 3 Phase, 125 A EP2 (CVCF / UPS): 208 VAC, Single phase, 50 A EP3 (CVCF): 120 VAC, 1 Phase, 5 A 2004 vintage.