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Laser Exposure head Patterning method: Optical mask method Exposure range: Entire workpiece Printing direction: 0, 90, 180, 270° Character / string tilt: Within ±3° Character line width: 30 µm Exposure position accuracy: ±150 µm Exposure illuminance: Over 1200 mW/cm² (405nm) Illuminance meter: USHIO (UIT201, UVD-405PD) Illuminance uniformity: Guaranteed value ±20% Exposure wavelength: h-line (405 nm) Light source: Laser diode Focus depth: ±0.5 mm.